Mask Aligner
ELS112SA
觀看設備規格：
- ELS112SA
| Work Size： | ψ200mm ~ 300mm wafer |
| Mask Size： | □9" or □14" Quartz or Soda Lime |
| Lamp House： | 1.89 KW |
| Wavelength Range： |
Broad Band ( i line : 365nm / h line : 400nm / g line : 436 nm ) |
| Light Intensity： | > 15 mW / cm2 based on 365 nm |
| Light Intensity Uniformity： | < 5% based on Dia. 12" wafer |
| Effective Exposure Area： | Max. □300 mm x 300 mm |
|
Compensation Leveling System Driven： |
By Auto |
| Contact Driven： | By Auto |
| Exposure Mode： | Proximity / Soft Contact / Hard Contact |
| Alignment System： | By CCD driven by manual method |
| Alignment Accuracy： | ± 3μm ( 12" ) |
| L/S Resolution： | 3μm based on contact Mode and PR thickness 1μm |
| Anti-vibration Table： | Yes |
| System Control： | PC Base |
| Option： |
Cut Filter DUV Lamp House Chuck for Broken wafer 積算光量功能 Power Meter Bottom Side Alignment System |
