Work Size: |
ψ150mm ~ 200mm wafer or Max. □200mm x 200 mm substrate |
Mask Size: | □7" or □9" Quartz or Soda Lime |
Lamp House Watt: | 660W~940W |
Wavelength Range: |
Broad Band ( i line : 365nm / h line : 400nm / g line : 436 nm ) |
Light Intensity: | > 20 mW / cm2 based on 365 nm |
Lamp Source: | UV Mercury Lamp |
Light Intensity Uniformity: | < 3% based on Dia. 8" wafer |
Effective Exposure Area: | Max. □200 mm x 200 mm |
Compensation Leveling System Driven: | By Auto |
Contact Driven: | By Auto |
Exposure Mode: |
Proximity / Soft Contact / Hard Contact / Vacuum Contact |
Alignment System: | By CCD driven by manual method |
Alignment Accuracy: | ±1μm |
L/S Resolution: | 1μm based on contact mode and PR thickness 1μm |
Anti-vibration Table: | Yes |
System Control: | PC Base |
Option: |
Cut Filter DUV Lamp House Chuck for Broken wafer 積算光量功能 Power Meter Bottom Side Alignment System |