Mask Aligner
ELS106FA/ELS106FA-B
觀看設備規格：
- ELS106FA-B
- ELS106FA
| Work Size： | ψ50mm ~ 150mm wafer |
| Mask Size： | □ 4" ~ □7" Quartz or Soda Lime |
| Lamp House Watt： | 250W |
| Wavelength Range： |
Broad Band ( i line : 365nm / h line : 400nm / g line : 436 nm ) |
| Light Intensity： |
> 16 mW / cm2 based on 365 nm (250W) > 40 mW / cm2 based on 365 nm (500W) |
| Lamp Source： | High Mercury Lamp |
| Light Intensity Uniformity： | < 3% based on Dia. 4" wafer |
| Effective Exposure Area： | Max. 150 mm x 150 mm |
| Robot Type： | Double arms with mapping system |
| Exposure Mode： |
Proximity / Soft Contact / Hard Contact / Vacuum Contact |
| Alignment Key： | 150 μm x 150μm And Smaller |
| Alignment Accuracy： |
±2μm for top side alignment ±3μm for bottom side alignment |
| L/S Resolution： | 1μm based on contact mode and PR thickness 1μm |
| Tact time： |
Top side : < 36 sec./pc Bottom side : < 45 sec./pc |
| System Control： | PC Base |
| Option： |
Cut Filter 500W Lamp House DUV Lamp House 積算光量功能 Power Meter |
| ELS Model No.： | ELS106FA-B |
| Work Size： |
ψ50mm ~ 150mm wafer |
| Mask Size： | □ 4" ~ □7" Quartz or Soda Lime |
| Lamp House Watt： | 250W |
| Wavelength Range： |
Broad Band ( i line : 365nm / h line : 400nm / g line : 436 nm ) |
| Light Intensity： |
> 16 mW / cm2 based on 365 nm (250W) > 40 mW / cm2 based on 365 nm (500W) |
| Lamp Source： | High Mercury Lamp |
| Light Intensity Uniformity： | < 3% based on Dia. 4" wafer |
| Effective Exposure Area： | Max. 150 mm x 150 mm |
| Robot Type： | Double arms with mapping system |
| Exposure Mode： |
Proximity / Soft Contact / Hard Contact / Vacuum Contact |
| Alignment Key： | 150 μm x 150μm And Smaller |
| Alignment Accuracy： | ±2μm |
| L/S Resolution： | 1μm based on contact mode and PR thickness 1μm |
| Tact time： | < 36 sec./pc |
| System Control： | PC Base |
| Option： |
Cut Filter 500W Lamp House DUV Lamp House 積算光量功能 Power Meter |
| ELS Model No.： | ELS106FA |
