Spin Developer
ELS7612FA (SEMI S2 Qualified Available)
觀看設備規格：
- ELS7612FA
| Wafer Size： | 200mm ~ 300mm wafer |
| Layout Unit： |
Auto Load Port / Robot + Track / Centering / Developer / HP / CP / ULD |
| Robot Type： | Double arms with mapping system |
| Clean Class： | Class 100 with HEPA |
| Spin Speed： | 30 ~ 5000 rpm |
| Acceleration： | 8000rpm / sec. |
| Developer Dispense Method : |
Pump with nozzle scan ability (Option : Developer Temperature Control System) |
| DIW Rinse / N2 Dry Nozzle： | YES |
| HP Temp. ： | 30 ~ 150°C (Option : max. 200°C) |
| Heating Method： | Contact / Proximity |
| System Control： |
PC Base (Option : SECS+GEM Available) |
| PLC Sequencer： | Mitsubishi Q series |
| Recipe： | 30 recipe x 50 step |
| Throughput / hr： | 90 ~ 120 pcs based on developer recipe |
