| Wafer Size: | 50mm ~ 300mm wafer |
| LD/ULD: | 2 Cassette |
| Robot : | Dual Arms |
| Clean Class: | Class 100 with HEPA |
| Chamber: | 2 ~ 4 |
|
Spin Speed: Acceleration: |
30 ~ 4000 rpm 4000 rpm / sec. |
| Chemical: |
Dispense:Stream or Spray Nozzle:1 ~ 4 nozzle/cup |
| Edge / Back Side Rinse: | Yes |
| Chemical Recycle: | Yes |
| Variable Arm Speed: | Yes |
| System Control: | PC Base |
| PLC Sequencer: | Mitsubishi Q series |
| Option: |
EFEM RF ID Reader Chemical Temperature Control System SECS/GEM |