Wafer Size: | 50mm ~ 300mm wafer |
LD/ULD: | 2 Cassette |
Robot : | Dual Arms |
Clean Class: | Class 100 with HEPA |
Chamber: | 2 ~ 4 |
Spin Speed: Acceleration: |
30 ~ 4000 rpm 4000 rpm / sec. |
Chemical: |
Dispense:Stream or Spray Nozzle:1 ~ 4 nozzle/cup |
Edge / Back Side Rinse: | Yes |
Chemical Recycle: | Yes |
Variable Arm Speed: | Yes |
System Control: | PC Base |
PLC Sequencer: | Mitsubishi Q series |
Option: |
EFEM RF ID Reader Chemical Temperature Control System SECS/GEM |