Wafer Size: | 50mm ~ 300mm wafer |
HPC Chamber: | 1 |
Spin Speed: | 30 ~ 4000 rpm |
High Pressure Nozzle: |
Stream / Spray / MCM® Type Pressure Control By Recipe |
Chemical: |
Temperature Control System Recycle / Fresh (Programmable) |
Top / Back Side Rinse: | Yes |
Variable Arm Speed: | Yes |
Cleaner Chamber: | 1 ~ 2 |
Nozzle: | Stream type |
Chemical: | IPA / DIW / ACE (option) |
Top / Back Side Rinse: | Yes |
System Control: | PC |
Option: |
Automatic Fire Extinguishing System CO2 Bubble System |