| Wafer Size: | 50mm ~ 300mm wafer |
| HPC Chamber: | 1 |
| Spin Speed: | 30 ~ 4000 rpm |
| High Pressure Nozzle: |
Stream / Spray / MCM® Type Pressure Control By Recipe |
| Chemical: |
Temperature Control System Recycle / Fresh (Programmable) |
| Top / Back Side Rinse: | Yes |
| Variable Arm Speed: | Yes |
| Cleaner Chamber: | 1 ~ 2 |
| Nozzle: | Stream type |
| Chemical: | IPA / DIW / ACE (option) |
| Top / Back Side Rinse: | Yes |
| System Control: | PC |
| Option: |
Automatic Fire Extinguishing System CO2 Bubble System |