| Wafer Size: | ψ200mm ~ 300mm wafer |
| Spin Speed: | 4000 rpm |
| Spin Speed Accuracy: | ± 1% |
| Sequencer: | Mitsubishi Series |
| Recipe: | 15 recipe x 24 step |
| Work Fixture: | By Vacuum |
| Stage Material: |
Al Option: Teflon |
| System Control: | PLC |
| PR coating uniformity: | ± 3% |
| Option: | PR Dispense System |