Spin Coater

ELS312MA

觀看設備規格:

  • ELS312MA
Wafer Size ψ200mm ~ 300mm wafer
Spin Speed: 4000 rpm
Spin Speed Accuracy ± 1%
Sequencer Mitsubishi Series
Recipe 15 recipe x 24 step
Work Fixture By Vacuum
Stage Material Al
Option: Teflon
System Control PLC
PR coating uniformity ± 3%
Option PR Dispense System

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