Wafer Size: | ψ200mm ~ 300mm wafer |
Spin Speed: | 4000 rpm |
Spin Speed Accuracy: | ± 1% |
Sequencer: | Mitsubishi Series |
Recipe: | 15 recipe x 24 step |
Work Fixture: | By Vacuum |
Stage Material: |
Al Option: Teflon |
System Control: | PLC |
PR coating uniformity: | ± 3% |
Option: | PR Dispense System |