Spin Coater
ELS306MA
觀看設備規格：
- ELS306MA
| Wafer Size： |
ψ50mm ~ 150mm wafer Max. □100mm x 100mm substrate |
| Spin Speed： | 100 ~ 7500 rpm |
| Spin Speed Accuracy： | ± 1% |
| Sequencer： | Mitsubishi Series |
| Recipe： | 15 recipe x 24 step |
| Work Fixture： | By Vacuum |
| Stage Material： |
Al Option: Teflon |
| System Control： | PLC |
| PR coating uniformity： | ± 3% |
| Option： |
PR Dispense System Chuck for Broken wafer |
