Spin Developer

ELS712SA

觀看設備規格:

  • ELS712SA
.
Work Size: ψ300mm wafer
Spin Speed 100 ~ 4500 rpm
Spin Speed Accuracy ±1%
Acceleration 3000rpm / Sec.
Developer Nozzle 1 ~ 3 System
DIW Nozzle 1 System
Back Side Rinse Yes
Recipe 20 Recipes x 40 Steps
Work Fixture By Vacuum
Stage Material Al
Option : Teflon
System Control PLC
Option Developer Temp. Control System 
N2 Dry nozzle

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