Mask Aligner
ELS108SA
觀看設備規格：
- ELS108SA
| Work Size： |
ψ150mm~200mm wafer or Max. □200mm x 200 mm substrate |
| Mask Size： | □7" or □9" Quartz or Soda Lime |
| Lamp House Watt： | 660W~940W |
| Wavelength Range： |
Broad Band ( i line :365nm / h line:400nm / g line: 436 nm) |
| Light Intensity： | > 20 mW / cm2 based on 365 nm |
| Lamp Source： | UV Mercury Lamp |
| Light Intensity Uniformity： | < 3% based on Dia. 8" wafer |
| Effective Exposure Area： | Max. □200 mm x 200 mm |
| Compensation Leveling System Driven： | By Auto |
| Contact Driven： | By Auto |
| Exposure Mode： |
Proximity / Soft Contact / Hard Contact / Vacuum Contact |
| Alignment System： | By CCD driven by manual method |
| Alignment Accuracy： | ±1μm |
| L/S Resolution： | 1μm based on contact mode and PR thickness 1μm |
| Anti-vibration Table： | Yes |
| System Control： | PC Base |
| Option： |
Cut Filter DUV Lamp House Chuck for Broken wafer 積算光量功能 Power Meter Bottom Side Alignment System |
