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Spin Coater

ELS3612FA (Option:SEMI S2 Qualifies)

觀看設備規格:

  • ELS3612FA
Wafer Size 200mm ~ 300mm wafer
Layout Unit: Auto Load port / Robot + Track / Centering / Coater / HP / CP / ULD
Robot Type Double arms with mapping system
Clean Class Class 100 with HEPA
Spin Speed 30 ~ 5000 rpm
Acceleration 8000 rpm / sec.
PR Dispense Method

N2 Pressure Tank or Pump

(Option:  PR Pump for High Viscosity up to 10,000 cps)

Edge / Back Side Rinse YES
HP Temp 30 ~ 200°C
Heating Method Contact / Proximity
System Control PC Base (Option : SECS+GEM available )
PLC Sequencer Mitsubishi Q series
Recipe 30 recipes x 50 steps
Throughput / hr Up to 50pcs based on Thick PR recipe

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